ELEDE 330 LED Plasma Etcher
ELEDE 330 LED Plasma Etcher
MOQ : piece
Lead Time : Days
Seller Support : Trade Authenticity Guaranteed & Accepting
Payment : L/C,T/T,Western Union, Money Gram, Credit Card, Paypal
Product details
Supply Ability
- Warranty(Year):1 Year
Packaging & Delivery
- Packaging: piece
Product Specifications
Product Description
Product Profile
As the first homemade LED etcher designed for LED volume production line, ELEDE 330 performs mostly etch processes in LED field. Some advanced technologies involving high-density plasma source,longer lifetime mechanicanl chunck, precise temperature control system, high-precise pressure control system, IC-level central gas inlet system and IC-level chamber surface treatment are successfully applied. Strict design requirements in IC etching system are adopted to realize better etching process performance so as to tremendously improve luminious efficiency of LED.
Product Features
ELEDE 330 LED etcher characterizes stable performance, low CoO/CoC and high uptime.
*Multi-trays, continual and automatic transfer and process remarkably improve the productivity.
*Software control system realizes autorun of entire process flow.
*Automatic RF matching ensures the plasma stability and uniformity.
*Plasma cleaning notably improves process repeatability and efficiently extend maintenance period.
*Considerate recipe management includes recipe editing, contrasting, copying and exporting etc.
*Software system provides real-time chamber condition monitor and graphic chart display.
*Software system provides the function of recording, searching an exporting of history possesss data.
*Safe interlock protection.
*Parts life tracing.
*Detailed rights management function in software system.
Superior Performance
Excellent uniformity
The design concept of high-end IC etcher and process chamber exclusively designed for LED etch ensure wafer to wafer etch rate uniformity and process repeatability in volume production.
High throughput design
ELEDE 330 is capable of loading and etching 27 pieces 2-inch or 7 pieces 4-inch GaN-based epitaxial layer wafers each run, which provide higher productivity. ELEDE 330 manual adopts the automatic mode of Cassette to Cassette, which efficiently shortens load period and markedly improve equipment utilization ratio.
Rapid plasma dry clean
Rapid plasma clean ensures process repeatability and sharply shorten prevention maintenance time.
Excellent equipment maintainability
ELEDE 330's unique temperature control design reduces the deposition of byproducts in process chamber and prolongs parts life and extends MTBC effectively.
You May Like
- Free Member
- Trade Assurance
Business Type : Manufacturer
Company Location: